| 品牌 |
产品编号
(生产商编号) |
产品名称 | 等级 | 规格 | 零售价(RMB) | CAS No. |
|
FUJIFILM Wako
------------------ 和光纯药 |
137-18072 |
O-Methylhydroxylammonium Chloride 甲氧基胺盐酸盐 |
for Gas Chromatography | 25 g |
|
593-56-6 |
|
FUJIFILM Wako
------------------ 和光纯药 |
138-17321 |
Methyl-d3 Stearate Standard 氘代硬脂酸甲酯标准品 |
for Gas Chromatography | 50 mg |
|
19905-56-7 |
|
FUJIFILM Wako
------------------ 和光纯药 |
139-16751 |
p-Methoxyphenyl-d7-boronic Acid
|
for Organic Synthesis | 500 mg |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
139-17993 |
1-Methyl-3-p-tolyltriazene 1-甲基-3-对甲苯基三氮 |
- | 5 g |
|
21124-13-0 |
|
FUJIFILM Wako
------------------ 和光纯药 |
143-04545 |
Nonenylsuccinic Anhydride 壬基琥珀酸酐 |
for Electron Microscopy | 500 g |
|
28928-97-4 |
|
FUJIFILM Wako
------------------ 和光纯药 |
145-08601 |
Ninhydrine Spray 茚三酮水合物 |
for Thin Layer Chromatography | 200 ml |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
146-08913 |
p-Nitroaniline
|
for Thin Layer Chromatography | 10 g |
|
100-01-6 |
|
FUJIFILM Wako
------------------ 和光纯药 |
161-24781 |
3-Pyridine-d4-boronic Acid 3-吡啶-d4-硼酸 |
for Organic Synthesis | 500 mg |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
163-25983 |
16w/v% Paraformaldehyde Solution, Methanol free 16w/v% 低聚甲醛溶液 |
for Electron Microscopy | 10 ml×10A |
|
50-00-0 |
|
FUJIFILM Wako
------------------ 和光纯药 |
164-06191 |
Polyamide B-10 聚酰胺B-10 |
for Thin Layer Chromatography | 100 g |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
165-26303 |
2,3,4,5,6-Pentafluorobenzoic Anhydride 2,3,4,5,6-五氟苯酸酐 |
- | 5 g |
|
15989-99-8 |
|
FUJIFILM Wako
------------------ 和光纯药 |
169-25441 |
2-Propanol-d8, 99.5%
|
for Nuclear Magnetic Resonance | 5 g |
|
22739-76-0 |
|
FUJIFILM Wako
------------------ 和光纯药 |
193-08401 |
Silicagel 70 F254 Plate-wako 硅胶79 F254层析板 |
for Thin Layer Chromatography | 10 plates(层厚：0.25 mm、size：5 cm×10 cm) |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
193-09861 |
Suppressor Solution 抑制剂溶液 |
for Ion Chromatography | 1 L |
|
N/A |
|
FUJIFILM Wako
------------------ 和光纯药 |
197-08404 |
Silicagel 70 F254 Plate-wako 硅胶79 F254层析板 |
for Thin Layer Chromatography | 100 plates(层厚：0.25 mm、size：5 cm×20 cm) |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
199-08403 |
Silicagel 70 F254 Plate-wako 硅胶79 F254层析板 |
for Thin Layer Chromatography | 25 plates(层厚：0.25 mm、size：20 cm×20 cm) |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
200-14271 |
Toluene-d8,99.6% 甲苯-d8，99.6% |
for Nuclear Magnetic Resonance | 10 g |
|
2037-26-5 |
|
FUJIFILM Wako
------------------ 和光纯药 |
200-19053 |
1,1,2,2-Tetrachloroethane-d2, 99.6% 氘代四氯乙烷 |
for Nuclear Magnetic Resonance | 100 g |
|
33685-54-0 |
|
FUJIFILM Wako
------------------ 和光纯药 |
201-16082 |
Toluene-d8,99.6% 甲苯-d8，99.6% |
for Nuclear Magnetic Resonance | 25 g |
|
2037-26-5 |
|
FUJIFILM Wako
------------------ 和光纯药 |
201-18863 |
2,4,6-Tri-t-butylnitrosobenzene 2,4,6-三叔丁若亚硝基苯 |
for Spin Trapping | 1 g |
|
24973-59-9 |
