| 品牌 |
产品编号
(生产商编号) |
产品名称 | 等级 | 规格 | 零售价(RMB) | CAS No. |
|
FUJIFILM Wako
------------------ 和光纯药 |
038-11371 |
Copper, Reduced, Granular 180 - 425um (40 - 80mesh) 铜，颗粒，180~425um（40~80目） |
for Elemental Analysis | 100 g |
|
7440-50-8 |
|
FUJIFILM Wako
------------------ 和光纯药 |
034-19531 |
Chlormadinone Acetate Standard 醋酸氯地孕酮标准品 |
for High Performance Liquid Chromatography | 200 mg |
|
302-22-7 |
|
FUJIFILM Wako
------------------ 和光纯药 |
147-06341 |
Nitrite Nitrogen Standard Solution 亚硝酸盐氮标准溶液 |
for Ion Chromatography | 50 ml |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
137-18251 |
MQCA Standard 3-甲基-喹啉-2-甲酸标准品 |
for High Performance Liquid Chromatography | 100 mg |
|
74003-63-7 |
|
FUJIFILM Wako
------------------ 和光纯药 |
151-01921 |
Oxolinic Acid Standard 噁喹酸标准品 |
for High Performance Liquid Chromatography | 200 mg |
|
14698-29-4 |
|
FUJIFILM Wako
------------------ 和光纯药 |
132-14524 |
Methanol 甲醇 |
or LC/MS | 100 ml |
|
67-56-1 |
|
FUJIFILM Wako
------------------ 和光纯药 |
081-08791 |
Heptadecane Standard 十七烯标准品 |
for Gas Chromatography | 100 mg |
|
629-78-7 |
|
FUJIFILM Wako
------------------ 和光纯药 |
163-25983 |
16w/v% Paraformaldehyde Solution, Methanol free 16w/v% 低聚甲醛溶液 |
for Electron Microscopy | 10 ml×10A |
|
50-00-0 |
|
FUJIFILM Wako
------------------ 和光纯药 |
044-26161 |
20mmol/l 2,3-Diaminopropionic Acid Soln 20mmol/l 2,3-二氨基丙酸溶液 |
for Ion Chromatography | 100 ml |
|
515-94-6 |
|
FUJIFILM Wako
------------------ 和光纯药 |
138-17321 |
Methyl-d3 Stearate Standard 氘代硬脂酸甲酯标准品 |
for Gas Chromatography | 50 mg |
|
19905-56-7 |
|
FUJIFILM Wako
------------------ 和光纯药 |
149-04841 |
Neodymium Standard Solution (1,000ppm) 钕标准溶液（Nd 1000） |
for Atomic Absorption Spectrochemical Analysis | 100 ml |
|
N/A |
|
FUJIFILM Wako
------------------ 和光纯药 |
135-17912 |
N-Methyl-N-trimethylsilylacetamide N-甲基-N-三甲基硅烷乙酰氨 |
for Gas Chromatography | 25 ml |
|
7449-74-3 |
|
FUJIFILM Wako
------------------ 和光纯药 |
136-18123 |
N-Methyl-N-trimethylsilylheptafluorobutyramide N-甲基-N-三甲基硅基七氟丁酰胺 |
for Gas Chromatography | 5 ml |
|
53296-64-3 |
|
FUJIFILM Wako
------------------ 和光纯药 |
193-08401 |
Silicagel 70 F254 Plate-wako 硅胶79 F254层析板 |
for Thin Layer Chromatography | 10 plates(层厚：0.25 mm、size：5 cm×10 cm) |
|
- |
|
FUJIFILM Wako
------------------ 和光纯药 |
195-08721 |
Samarium Standard Solution 钐标准溶液（Sm 1000） |
for Atomic Absorption Spectrochemical Analysis | 100 ml |
|
N/A |
|
FUJIFILM Wako
------------------ 和光纯药 |
193-09861 |
Suppressor Solution 抑制剂溶液 |
for Ion Chromatography | 1 L |
|
N/A |
|
FUJIFILM Wako
------------------ 和光纯药 |
018-11933 |
Acetone-d6, 99.9% 丙酮-d6, 99.9% |
for Nuclear Magnetic Resonance | 50 g |
|
666-52-4 |
|
FUJIFILM Wako
------------------ 和光纯药 |
200-19053 |
1,1,2,2-Tetrachloroethane-d2, 99.6% 氘代四氯乙烷 |
for Nuclear Magnetic Resonance | 100 g |
|
33685-54-0 |
|
FUJIFILM Wako
------------------ 和光纯药 |
017-19862 |
Acetone-d6, 99.9% 丙酮-d6,99.9% |
for Nuclear Magnetic Resonance | 25 g |
|
666-52-4 |
|
FUJIFILM Wako
------------------ 和光纯药 |
044-17371 |
N,N-Dimethylformamide Dibutyl Acetal N,N-二甲基甲酰胺二丁基缩醛 |
for Gas Chromatography | 5 ml |
|
18503-90-7 |
